47744.1 IP-ENG

Résumé

Ion Beam Sputtering of 2D materials # A new approach

Textes supplémentaires

Abstract

Goal of the project is to design, build and utilize a new ion beam sputtering tool for the synthesis of 2D materials such as graphene and transition metal dichalcogenides. The potential of the new developed technology and processes for a number of innovative applications will be demonstrated.

Participants

Heidi Thomé

Kontaktperson

RhySearch Heidi Thomé Werdenbergstrasse 4 9471 Buchs SG CH

Détails du projet

Office de recherche: INNOSUISSE
Statut du projet: Abgeschlossen
Type de projet: Forschungsprojekt
Date de début: 2020-09-30
Date de fin: 2023-08-31
Coûts totaux approuvés: CHF 281878.34
Section: 70 Engineering
Domaine politique NABS: Industrielle Produktivität und Technologie

Disciplines de recherche

T120 Systems engineering, computer technology 100.0%